SINGLE WAFER SPIN CLEANER

• Fully automatic wafer cleaning machine, 8 "/12" shared machine, switching only requires replacing the FOUP adapter.
  Having multifunctional features, integrating different functions for different applications.
  Equipped with functions such as high-speed centrifugal rotation, HPC, two fluid, brush, SC1 chemical cleaning, and the ability to install megasonic waves.
  Suitable for processes such as Particle cleaning, Flux cleaning, and photoresist residue cleaning.
  The flow field simulation chamber design and unique sealing design provide the cleanest cleaning environment for the process.
  Friendly software interface, providing safe and convenient chip manufacturing processes for mass production and engineering.