Backside Wafer Etching Machine
Supports 6/8/12-inch wafers in post-thinning etching processes, ideal for handling thin and fragile wafers.
To address the fragility of thin wafers, the equipment is equipped with a Bernoulli Robot and Bernoulli Spin Chuck for non-contact transport and support, minimizing breakage during etching and ensuring wafer safety throughout the process. For warped wafers, it offers a flattening feature to ensure process stability and prevent stress marks from vacuum chucking.
Additionally, the system includes an advanced chemical recycling design with a recovery ring and exhaust system, enhancing chemical purity and recovery rates, reducing costs, and improving environmental sustainability.