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Backside Wafer Etching Machine
Supports 6/8/12-inch wafers in post-thinning etching processes, ideal for handling thin and fragile wafers.
To address the fragility of thin wafers, the equipment is equipped with a Bernoulli Robot and Bernoulli Spin Chuck for non-contact transport and support, minimizing breakage during etching and ensuring wafer safety throughout the process. For warped wafers, it offers a flattening feature to ensure process stability and prevent stress marks from vacuum chucking.
Additionally, the system includes an advanced chemical recycling design with a recovery ring and exhaust system, enhancing chemical purity and recovery rates, reducing costs, and improving environmental sustainability.
Backside Wafer Etching Machine
产品特点
01
The equipment precisely controls wafer thickness, ensuring consistency throughout production. For 12-inch wafers, the warp is controlled to exceed 8mm, effectively preventing uneven processing caused by warping.
02
The equipment is designed for 12-inch wafer processes, ensuring backside silicon etching uniformity within 5%. This significantly improves etching precision and ensures high-quality production.
03
In large-scale production, the equipment controls the breakage rate to within 100 PPM, significantly reducing waste and improving overall product yield.
04
The rotary chuck offers high-speed, stable rotation with an adjustable speed range from 10 to 2000 RPM, supporting both forward and reverse rotation. Its anti-static design prevents static interference with the wafers, ensuring stable and safe production.
05
The equipment features a high-precision chemical temperature control system with a tolerance of ±0.5℃. This ensures consistent chemical temperature throughout the production process, enhancing product quality and stability.
06
The equipment incorporates a unique design that effectively prevents wafer circuit surface corrosion, significantly improving product yield and ensuring high-quality output during production.
07
The equipment is equipped with up to three chemical recovery rings, achieving a recovery rate of over 96%. This significantly reduces chemical waste, lowers production costs, and enhances environmental sustainability.
应用范围
技术参数
Application
8”  12” wafer etching and washing, specially for 2.5D/3D chiplet advanced packaging thin wafers.
WPH
≥15pcs/H/Chamber(based on TT180s)
Chamber type
Single Bernoulli Spin Chammber
Load/Unload
FOUP / SMIF / Cassette
Wafer Clamper
Bernoulli and edge griper
Controller
HMI + PLC
Material
Outside:WPP / FMPVC      Structure:Stainless Steel
Temperature precision
±0.5℃
Noise
<75db
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深圳市凯尔迪光电科技有限公司

2024年8月07日